Lithography based on memory effects resulting from photoinduced self-assembly of pyrene dimers in thin polymer films

Chemistry of Materials

Volumn 21, Issue 17, 2009, Pages 3933-3940

  Ivan, Marius G ^a,b   Scaiano, J C ^a  

^a UNIVERSITY OF OTTAWA   (Canada)

^b HOLST CENTRE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CONSTANT ENERGY; EXCIMER EMISSIONS; EXCIMER FORMATION; EXCIMERS; FLUORESCENT IMAGES; INFORMATION STORAGE; LASER WAVELENGTH; LITHOGRAPHIC MASK; MATRIX; MEMORY EFFECTS; PHOTOINDUCED SELF-ASSEMBLY; PULSED LASER IRRADIATION; RIGID POLYMERS; ROOM TEMPERATURE; TEMPERATURE CHANGES; THIN POLYMER FILMS;

FLUORESCENCE; FLUORESCENCE MICROSCOPY; LASER EXCITATION; LASERS; LIGHT; OLIGOMERS; POLYMERS; PULSED LASER APPLICATIONS; THERMAL EFFECTS;

POLYMER FILMS;

EID: 69949084544     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm900731p     Document Type: Article

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