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Volumn 282, Issue 21, 2009, Pages 4242-4248
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Fiber grating couplers for silicon nanophotonic circuits: Design modeling methodology and fabrication tolerances
a
CEA GRENOBLE
(France)
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS FABRICATION;
COUPLED BEAMS;
COUPLING ANGLES;
COUPLING CONDITION;
COUPLING LOSS;
COUPLING STRUCTURES;
CROSS SECTION;
DATA TRANSMISSION NETWORKS;
DESIGN MODELING;
DIFFRACTION GRATING COUPLERS;
FABRICATION TOLERANCES;
FIBER COUPLINGS;
FIBER GRATINGS;
FIBER-TO-WAVEGUIDE COUPLING;
FUNCTIONAL INTEGRATION;
GRATING COUPLERS;
ITERATIVE NUMERICAL METHOD;
NANOPHOTONIC CIRCUITS;
SILICON WAVEGUIDE;
FIBERS;
LIGHT TRANSMISSION;
NANOPHOTONICS;
OPTICAL FIBER FABRICATION;
OPTICAL FIBERS;
OPTIMIZATION;
WAVEGUIDES;
COUPLED CIRCUITS;
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EID: 69849104506
PISSN: 00304018
EISSN: None
Source Type: Journal
DOI: 10.1016/j.optcom.2009.07.060 Document Type: Article |
Times cited : (14)
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References (15)
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