Effect of post annealing on the resistive switching of TiO2 thin film

Microelectronic Engineering

Volumn 86, Issue 11, 2009, Pages 2153-2156

  Kim, Wan Gee ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

ReRAM; Resistive switching; TiO2

Indexed keywords

BOTTOM ELECTRODES; ELECTRON TRANSFER PROCESS; GRAIN SIZE; MAGNETRON SPUTTERING SYSTEMS; POST ANNEALING; POTENTIAL BARRIER HEIGHT; RERAM; RESISTIVE SWITCHING; RESISTIVE SWITCHING BEHAVIORS; TIO; TIO2;

ANNEALING; PLATINUM; SILVER; SWITCHING SYSTEMS; THIN FILM DEVICES; THIN FILMS;

SWITCHING;

EID: 69549103351     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.02.028     Document Type: Article

References (16)

1. A.K. Sharma, Advanced Semiconductor Memories: Architectures, Designs, and Applications, Wiley-Interscience, New Jersey, 2003, p. 602.
2. Park J.W., Park J.W., Kim D.Y., and Lee J.K. J. Vac. Sci. Technol. A 23 (2005) 1309
3. Choi B.J., Jeong D.S., Kim S.K., Rohde C., Choi S., Oh J.H., Kim H.J., Hwang C.S., Szot K., Waser R., Reichenberg B., and Tiedke S. J. Appl. Phys. 98 (2005) 033715
4. Lee D.S., Choi H.J., Sim H.J., Choi D.H., Hwang H.S., Lee M.J., Seo S.A., and Yoo I.K. IEEE Electron Device Lett. 26 (2005) 719
5. Sawa A., Fujii T., Kawasaki M., and Tokura Y. Appl. Phys. Lett. 85 (2004) 4373
6. Contreras J.R., Kohlstedt H., Poppe U., Waser R., Buchal C., and Pertsev N.A. Appl. Phys. Lett. 83 (2003) 4595
7. Rakhshani A.E. J. Appl. Phys. 69 (1991) 2365
8. Jeong D.S., Schroeder H., and Waser R. Electrochem. Solid-State Lett. 10 8 (2007) G51
9. Lin C.Y., Wu C.Y., Wu C.Y., Lee T.C., Yang F.L., Hu C., and Tseng T.Y. IEEE Electron Device Lett. 28 (2007) 366
10. Diebold U. Surf. Sci. Rep. 48 (2003) 53
11. Dorjpalam E., Takahashi M., Tokuda Y., and Yoko T.O. Thin Solid Films 483 (2005) 147
12. Kim C.J., and Chen I.W. Thin Solid Films 515 (2006) 2726
13. Seo S., Lee M.J., Kim D.C., Ahn S.E., Park B.H., Kim Y.S., Yoo I.K., Byun I.S., Hwang I.R., Kim S.H., Kim J.S., Choi J.S., Lee J.H., Jeon S.H., Hong S.H., and Park B.H. Appl. Phys. Lett. 87 (2005) 263507
14. Kim K.M., Choi B.J., Jeong D.S., and Hwang C.S. Appl. Phys. Lett. 89 (2006) 162912
15. Rohde C., Choi B.J., Jeong D.S., Choi S., Zhao J.S., and Hwang C.S. Appl. Phys. Lett. 86 (2005) 262907
16. Dearnaley G., Stoneham A.M., and Morgan D.V. Rep. Prog. Phys. 33 (1970) 1129