On the fundamental mechanisms of active screen plasma nitriding

Vacuum

Volumn 84, Issue 2, 2009, Pages 321-325

  Corujeira Gallo, Santiago ^a   Dong, Hanshan ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

Active screen; Iron nitride; Nitriding mechanisms; Plasma nitriding

Indexed keywords

ACTIVE SCREEN; ACTIVE SCREEN PLASMA NITRIDING; DC PLASMA; DEPOSITED MATERIALS; DEPOSITION LAYERS; FLOATING POTENTIALS; FOCUS OF ATTENTION; HARDENING EFFECTS; IRON NITRIDE; IRON NITRIDES; MASS TRANSFER OF NITROGEN; PLASMA NITRIDING; REDEPOSITION; XRD ANALYSIS;

NITRIDES; NITRIDING; PLASMA DEPOSITION; PLASMAS; SURFACE TREATMENT; ULTRAHIGH MOLECULAR WEIGHT POLYETHYLENES;

CASE HARDENING;

EID: 69349087553     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.07.002     Document Type: Article

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