On the mechanisms of diode plasma nitriding in N2-H2 mixtures under DC-pulsed substrate biasing

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 1211-1219

  Walkowicz, Jan ^a  

^a NATIONAL RESEARCH INSTITUTE   (Poland)

Author keywords

Active species; Mass spectrometry; Mechanisms of diode plasma nitriding; Optical emission spectroscopy; Plasma nitriding

Indexed keywords

DISSOCIATION; NITROGEN; SUBSTRATES;

NITRIDING INTENSITY;

PLASMA APPLICATIONS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0043194084     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00656-X     Document Type: Article

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