SCOPUS 정보 검색 플랫폼

Electrochimica Acta

Volumn 54, Issue 26, 2009, Pages 6594-6597

Influence of surface morphology on oxide growth in porous alumina

(3) Kopp, Olga a Lelonek, Monika a Knoll, Meinhard a

a UNIVERSITY OF MÜNSTER (Germany)

Author keywords

Concave surface; Convex surface; Oxide growth; Porous alumina; Surface morphology

Indexed keywords

ALUMINIUM OXIDE; CONCAVE SURFACE; CONVEX SURFACE; CONVEX SURFACES; ELECTRICAL FIELD STRENGTH; OXIDE GROWTH; OXIDE THICKNESS; PLANAR SURFACE; POROUS ALUMINA; REACTION PARAMETERS; SIMPLE MODEL;

MORPHOLOGY; REACTION RATES; SURFACE REACTIONS; SURFACES;

SURFACE MORPHOLOGY;

EID: 69249098898 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2009.06.014 Document Type: Article

Times cited : (12)

References (15)

1
- 0000073686
- Hanaoka T.-A., Heilmann A., Kröll M., Kormann H.-P., Sawitowski T., Schmid G., Jutzi P., Klipp A., Kreibig U., and Neuendorf R. Appl. Organometal. Chem. 12 (1998) 367
- (1998) Appl. Organometal. Chem. , vol.12 , pp. 367
- Hanaoka, T.-A.¹ Heilmann, A.² Kröll, M.³ Kormann, H.-P.⁴ Sawitowski, T.⁵ Schmid, G.⁶ Jutzi, P.⁷ Klipp, A.⁸ Kreibig, U.⁹ Neuendorf, R.¹⁰

2
- 0036501820
- Gao T., Meng G., Zhang J., Sun S., and Zhang L. Appl. Phys. A 74 (2002) 403
- (2002) Appl. Phys. A , vol.74 , pp. 403
- Gao, T.¹ Meng, G.² Zhang, J.³ Sun, S.⁴ Zhang, L.⁵

3
- 0005656995
- Jessensky O., Müller F., and Gösele U. Appl. Phys. Lett. 72 (1998) 1173
- (1998) Appl. Phys. Lett. , vol.72 , pp. 1173
- Jessensky, O.¹ Müller, F.² Gösele, U.³

4
- 0032205746
- Jessensky O., Müller F., and Gösele U. J. Electrochem. Soc. 145 (1998) 3735
- (1998) J. Electrochem. Soc. , vol.145 , pp. 3735
- Jessensky, O.¹ Müller, F.² Gösele, U.³

5
- 0035272696
- Asoh H., Nishio K., Nakao M., Yokoo A., Tamamura T., and Masuda H. J. Vac. Sci. Technol. B 19 (2001) 569
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 569
- Asoh, H.¹ Nishio, K.² Nakao, M.³ Yokoo, A.⁴ Tamamura, T.⁵ Masuda, H.⁶

6
- 0000848295
- Li A.P., Müller F., Birner A., Nielsch K., and Gösele U. J. Appl. Phys. 84 (1998) 6023
- (1998) J. Appl. Phys. , vol.84 , pp. 6023
- Li, A.P.¹ Müller, F.² Birner, A.³ Nielsch, K.⁴ Gösele, U.⁵

7
- 0000070894
- Li A.P., Müller F., Birner A., Nielsch K., and Gösele U. J. Vac. Sci. Technol. A 17 (1999) 1428
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 1428
- Li, A.P.¹ Müller, F.² Birner, A.³ Nielsch, K.⁴ Gösele, U.⁵

8
- 0347372922
- Nielsch K., Choi J., Schwirn K., and Wehrspohn R.B. Nano Lett. 2 (2002) 677
- (2002) Nano Lett. , vol.2 , pp. 677
- Nielsch, K.¹ Choi, J.² Schwirn, K.³ Wehrspohn, R.B.⁴

9
- 0002681071
- Hoar T.P., and Mott N.F. J. Phys. Chem. Solids 9 (1959) 97
- (1959) J. Phys. Chem. Solids , vol.9 , pp. 97
- Hoar, T.P.¹ Mott, N.F.²

10
- 0344871590
- Våland T., and Heusler K.E. J. Electroanal. Chem. 149 (1983) 71
- (1983) J. Electroanal. Chem. , vol.149 , pp. 71
- Våland, T.¹ Heusler, K.E.²

11
- 84937405113
- Parkhutik V.P., and Shershutsky V.I. J. Phys. D: Appl. Phys. 25 (1992) 1258
- (1992) J. Phys. D: Appl. Phys. , vol.25 , pp. 1258
- Parkhutik, V.P.¹ Shershutsky, V.I.²

12
- 69249094199
- in press
- M. Lelonek, O. Kopp, M. Knoll, Electrochim. Acta, in press.
- Electrochim. Acta
- Lelonek, M.¹ Kopp, O.² Knoll, M.³

13
- 18844442866
- Meng G., Jung Y.J., Cao A., Vajtai R., and Ajayan P.M. PNAS 120 (2005) 7074
- (2005) PNAS , vol.120 , pp. 7074
- Meng, G.¹ Jung, Y.J.² Cao, A.³ Vajtai, R.⁴ Ajayan, P.M.⁵

14
- 61449178762
- Linping X., Zhihao Y., and Xiaoguang Z. Chin. Sci. Bull. 51 (2006) 2055
- (2006) Chin. Sci. Bull. , vol.51 , pp. 2055
- Linping, X.¹ Zhihao, Y.² Xiaoguang, Z.³

15
- 0037051242
- Sui Y.C., Cui B.Z., Martinez L., Perez R., and Sellmyer D.J. Thin Solid Films 406 (2002) 64
- (2002) Thin Solid Films , vol.406 , pp. 64
- Sui, Y.C.¹ Cui, B.Z.² Martinez, L.³ Perez, R.⁴ Sellmyer, D.J.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.