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Volumn 355, Issue 37-42, 2009, Pages 1786-1791
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Strain-eliminating chemical bonding self-organizations within intermediate phase (IP) windows in chalcogenide, oxide and nitride non-crystalline bulk glasses and deposited thin film binary, ternary and quaternary alloys
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Author keywords
Alkali silicates; Amorphous semiconductors; Borosilicates; Chalcogenides; Glass transition; Mechanical, stress relaxation; Medium range order; Oxide glasses; Percolation; Structural relaxation
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Indexed keywords
ALKALI SILICATES;
BOROSILICATES;
MECHANICAL, STRESS RELAXATION;
MEDIUM-RANGE ORDER;
OXIDE GLASSES;
PERCOLATION;
ALKALINITY;
AMORPHOUS SEMICONDUCTORS;
BINARY ALLOYS;
CERIUM ALLOYS;
CHALCOGENIDES;
CHEMICAL ANALYSIS;
CHEMICAL BONDS;
GLASS TRANSITION;
INTERNET PROTOCOLS;
NITRIDES;
OPTICAL GLASS;
PHASE CHANGE MEMORY;
PHASE INTERFACES;
RESIDUAL STRESSES;
SILICATES;
SOLVENTS;
STRESS RELAXATION;
STRUCTURAL RELAXATION;
THIN FILMS;
WINDOWS;
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EID: 69149092650
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2009.04.044 Document Type: Article |
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Times cited : (2)
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References (15)
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