Raman scattering analysis of SiH bond stretching modes in hydrogenated microcrystalline silicon for use in thin-film photovoltaics

Solar Energy Materials and Solar Cells

Volumn 93, Issue 10, 2009, Pages 1904-1906

  Johnson, E V ^a   Kroely, L ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

FTIR; Hydrogen; Microcrystalline silicon; Microstructure; PECVD; Raman; Thin film silicon

Indexed keywords

BOROSILICATE GLASS; CYCLOTRONS; ELECTRON CYCLOTRON RESONANCE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; HYDROGENATION; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; SILICON COMPOUNDS; SOLAR CELLS; SUBSTRATES; THIN FILMS;

BOROSILICATE GLASS SUBSTRATES; DISTRIBUTED ELECTRON CYCLOTRON RESONANCES; FTIR; HYDROGENATED MICROCRYSTALLINE SILICON; PHOTOVOLTAIC APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITIONS (PECVD); RAMAN; THIN FILM SILICON;

MICROCRYSTALLINE SILICON;

EID: 68349105778     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.06.018     Document Type: Article

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