Mechanism of N + NO Reaction on Rh(111) surfaces: A precursor-mediated reaction

Journal of Physical Chemistry C

Volumn 113, Issue 30, 2009, Pages 13257-13265

  Nakai, Ikuyo ^a   Kondoh, Hiroshi ^b   Shimada, Toru ^c   Nagasaka, Masanari ^d   Yokota, Reona ^e   Katayama, Tetsuo ^f   Amemiya, Kenta ^g   Orita, Hideo ^h   Ohta, Toshiaki ⁱ  

^a KYOTO UNIVERSITY   (Japan)

^b KEIO UNIVERSITY   (Japan)

^c RIKKYO UNIVERSITY   (Japan)

^d INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

^e SEKISUI CHEMICAL CO LTD   (Japan)

^f UNIVERSITY OF TOKYO   (Japan)

^g HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

^h NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

ⁱ RITSUMEIKAN UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC NITROGEN; MEDIATED REACTIONS; NEAR-EDGE X-RAY ABSORPTION FINE STRUCTURE SPECTROSCOPIES; NO DIMER; SECOND LAYER;

CHEMISORPTION; RHODIUM;

ABSORPTION SPECTROSCOPY;

EID: 68249112177     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp902583x     Document Type: Article

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