Chemisorption geometry of NO on Rh(111) by X-ray photoelectron diffraction

Surface Science

Volumn 359, Issue 1-3, 1996, Pages 269-279

  Kim, Y J ^a   Thevuthasan, S ^a   Herman, G S ^a   Peden, C H F ^a   Chambers, S A ^a   Belton, D N ^b   Permana, H ^b  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b GENERAL MOTORS CORPORATION   (United States)

Author keywords

Nitrogen oxides; Photoelectron diffraction; Rhodium; Solid gas interfaces; Surface chemical reaction

Indexed keywords

CHEMICAL BONDS; CHEMICAL REACTIONS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRON DIFFRACTION; LOW ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; MOLECULES; NITROGEN OXIDES; PHASE INTERFACES; RHODIUM; SURFACE STRUCTURE;

SINGLE SCATTERING CLUSTER THEORY; SOLID GAS INTERFACES;

CHEMISORPTION;

EID: 0030190201     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00027-1     Document Type: Article

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