A soft X-ray beamline for surface chemistry at the Photon Factory

Journal of Electron Spectroscopy and Related Phenomena

Volumn 124, Issue 2-3, 2002, Pages 151-164

  Amemiya, Kenta ^a   Kondoh, Hiroshi ^a   Yokoyama, Toshihiko ^a   Ohta, Toshiaki ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

Energy dispersive NEXAFS; Soft X ray beamline; Surface chemistry; X Ray absorption fine structure (XAFS)

Indexed keywords

ELECTRON DIFFRACTION; ENERGY DISPERSIVE SPECTROSCOPY; OPTICAL RESOLVING POWER; PHOTOEMISSION; PHOTONS; SURFACE CHEMISTRY; X RAY DIFFRACTION ANALYSIS;

PHOTOEMISSION SPECTROSCOPY (PES); X-RAY ABSORPTION FINE STRUCTURES (XAFS); X-RAY MAGNETIC CIRCULAR DICHROISM (XMCD);

X RAYS;

EID: 0036644150     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(02)00051-8     Document Type: Article

References (18)

1. High resolution core level photoelectron spectroscopy of surfaces and adsorbates