Preparation, corrosion and structural properties of Cu-Ni multilayers from sulphate/citrate bath

Corrosion Science

Volumn 51, Issue 9, 2009, Pages 2139-2143

  Rajasekaran, N ^a   Mohan, S ^a  

^a CENTRAL ELECTROCHEMICAL RESEARCH INSTITUTE   (India)

Author keywords

A. Metal coatings (TM); B. EIS (T); B. Potentiostatic (T); C. Electrodeposited films (PP)

Indexed keywords

A. METAL COATINGS (TM); B. EIS (T); B. POTENTIOSTATIC (T); C. ELECTRODEPOSITED FILMS (PP); COMPACT STRUCTURES; DEPOSITION POTENTIAL; FACE CENTERED CUBIC LATTICE; MULTILAYER STRUCTURES; POTENTIOSTATIC ELECTRODEPOSITION; PULSE PLATING; SEM; SMALL GRAINS; X RAY FLUORESCENCE;

ATOMIC FORCE MICROSCOPY; CORROSION RESISTANCE; CYCLIC VOLTAMMETRY; ELECTROCHEMICAL CORROSION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTROPLATING; METALLIC FILMS; METALS; NICKEL; PROTECTIVE COATINGS; PUMPING PLANTS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

MULTILAYERS;

EID: 68049089772     PISSN: 0010938X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.corsci.2009.05.052     Document Type: Article

References (25)

1. Ross C.A. Ann. Rev. Mater. Sci. 24 (1994) 159
2. Alper M., Attenborough K., Hart R., Lane S.J., Lashmore D.S., Younes C., and Schwarzacher W. Appl. Phys. Lett. 63 (1993) 2144
3. Schwarzacher W., and Lashmore D.S. IEEE Trans. Magn. 32 (1996) 3133
4. Lenczowski S.K.J., Schonenberger C., Gijs M.A.M., and de jonge W.J.M. J. Magn. Magn. Mater. 148 (1995) 455
5. Peter L., Kupay Z., Cziraki A., Pader J., Toth J., and Bakonyi I. J. Phys. Chem. B 105 (2001) 10867
6. Bakonyi I., Toth J., Goualou L., Becsei T., Toth-Kadar E., Schwarzacher W., and Nabiyouni G. J. Electrochem. Soc. 149 (2002) C195
7. Meuleman W.R.A., Roy S., Peter L., and Varga I. J. Electrochem. Soc. 149 (2002) C479
8. Shima M., Salamanca-Riba L., McMichael R.D., and Moffat T.P. J. Electrochem. Soc. 149 (2002) C439
9. Nabiyouni G., Kasyutich O.I., Roy S., and Schwarzacher W. J. Electrochem. Soc. 149 (2002) C218
10. Alper M., Schwarzacher W., and Lane S.J. J. Electrochem. Soc. 144 (1997) 2346
11. Nabiyouni G., and Schwarzacher W. J. Magn. Magn. Mater. 156 (1996) 355
12. Chassaing E., Morrone A., and Schmidt J.E. J. Electrochem. Soc. 146 (1999) 1794
13. Weihnacht V., Peter L., Toth J., Padar J., Kerner Zs., Schneider C.M., and Bakonyi I. J. Electrochem. Soc. 150 (2003) C507
14. Stout L.E., Burch O.G., and Langdorf A.S. Trans. Electrochem. Soc. 57 (1930) 113
15. Baskaran I., Shankara Narayanan T.S.N., and Stephen A. Mater. Lett. 60 (2006) 1990
16. Meuleman W.R.A., Roy S., Peter L., and Bakonyi I. J. Electrochem. Soc. 151 (2004) C256
17. Ishikawa M., and Enomoto H. J. Met. Finish. Soc. Jpn. 31 (1980) 545
18. Mizushima I., chikazawa M., and Watanabe T. J. Electrochem. Soc. 143 (1996) 1978
19. Cziraki A., Pierron-Bohnes V., Ulhag-Bouillet C., Toth-Kadar E., and Bakonyi J. Thin Solid Films 318 (1998) 239
20. Breadly P., Roy S., and Landalt D. J. Chem. Soc. Faraday Trans. 92 (1996) 4015
21. Kim S.H., Erb U., Aust K.T., Ganzalaz F., and Palumbo G. Plat. Surf. Finish. 5 (2004) 68
22. Mu H., Seok J., and Lin R.Y. J. Electrochem. Soc. 150 2 (2003) C67
23. Williamson G.B., and Smallman R.C. Philos. Mag. 1 (1956) 34
24. Senthilkumar V., Venkatachalam S., Viswanathan C., Gopal S., Narayanadass Sa.K., Mangalaraj D., Wilson K.C., and Vijayakumar K.P. Cryst. Res. Tech. 40 (2005) 573
25. Smith J.R., Breakspear S., and Cambell S.A. Trans. Inst. Met. Finish. 81 (2003) B55