Advances in novel plasma devices based on the plasma lens

IEEE Transactions on Plasma Science

Volumn 37, Issue 7 PART 2, 2009, Pages 1283-1288

  Goncharov, Alexey A ^a   Evsyukov, Anton N ^a   Litovko, Irina V ^b  

^a INSTITUTE OF PHYSICS   (Ukraine)

^b INSTITUTE FOR NUCLEAR RESEARCH   (Ukraine)

Author keywords

Ion beam; Magnetron; Plasma application; Plasma device; Sputtering system

Indexed keywords

CROSSED ELECTRIC AND MAGNETIC FIELDS; CYLINDRICAL MAGNETRON SPUTTERING; CYLINDRICAL PLASMAS; ELECTROSTATIC PLASMA LENS; EXPERIMENTAL INVESTIGATIONS; ION TREATMENT; LOW PRESSURES; MAGNETIC FIELD LINE; MAGNETIC INSULATION; NEW RESULTS; OPTIMAL OPERATING CONDITIONS; PHYSICAL MECHANISM; PLASMA DISCHARGE; PLASMA LENS; PROCESSING SYSTEMS; SPATIAL CONFIGURATION; SPUTTERING SYSTEM; STAND -ALONE; THEORETICAL INVESTIGATIONS;

ELECTROSTATIC DEVICES; ELECTROSTATIC LENSES; ION BEAMS; IONS; LENSES; MAGNETIC FIELDS; MAGNETRONS; MAGNETS; OPTICAL INSTRUMENTS; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA STABILITY; PLASMAS;

ELECTRIC DISCHARGES;

EID: 67949088160     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2009.2014762     Document Type: Review

References (6)

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