메뉴 건너뛰기




Volumn 131, Issue 11, 2009, Pages 4006-4011

Photo-induced and resist-free imprint patterning of fullerene materials for use in functional electronics

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVE MATERIAL; BUTYRIC ACIDS; FUNCTIONAL ARRAYS; GENERIC METHOD; METHYL ESTERS; ORGANIC SEMICONDUCTOR; PATTERNED MATERIALS; PATTERNING TECHNIQUES; PHOTO-INDUCED; PHOTORESIST MATERIALS; VISIBLE LASER LIGHT;

EID: 67849129017     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja807964x     Document Type: Article
Times cited : (62)

References (34)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.