Top-down lithographic method for inducing strain in carbon nanotubes

Journal of Applied Physics

Volumn 106, Issue 1, 2009, Pages

  Kumar, Rajay ^a   Aykol, Mehmet ^a   Ryu, Koungmin ^a   Zhou, Chongwu ^a   Cronin, Stephen B ^a  

^a University of Southern California ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNED NANOTUBES; BAND GAPS; CHEMICAL ETCHING; LITHOGRAPHIC METHODS; METALLIC NANOTUBES; RAMAN INTENSITIES; RAMAN SPECTRA; RESONANT TRANSITION; ROOM TEMPERATURE; TOPDOWN;

LITHOGRAPHY; RAMAN SPECTROSCOPY; STRAIN;

CARBON NANOTUBES;

EID: 67650915746     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3159886     Document Type: Article

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