Optical characterization of ZnO thin films deposited by RF magnetron sputtering method

Science in China, Series E: Technological Sciences

Volumn 52, Issue 8, 2009, Pages 2200-2203

  Tang, Ning ^a   Wang, Jinliang ^a   Xu, Hengxing ^a   Peng, Hongyong ^a   Fan, Chao ^a  

^a BEIHANG UNIVERSITY   (China)

Author keywords

RF magnetron sputtering; Ultraviolet transmission spectrum; XRD; ZnO thin films

Indexed keywords

AMORPHOUS GLASS; CRYSTALLINE QUALITY; OPTICAL BAND GAP ENERGY; OPTICAL CHARACTERIZATION; PROCESS PARAMETER EFFECT; PROCESS PARAMETERS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING METHOD; RF-POWER; STRUCTURAL AND OPTICAL PROPERTIES; ULTRAVIOLET TRANSMISSION SPECTRUM; WORKING PRESSURES; XRD; ZNO THIN FILM; ZNO THIN FILMS;

CRYSTALLINE MATERIALS; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; OPTICAL PROPERTIES; PLASMA DIAGNOSTICS; SEMICONDUCTING ZINC COMPOUNDS; THIN FILM DEVICES; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

OPTICAL FILMS;

EID: 67650757550     PISSN: 10069321     EISSN: 1862281X     Source Type: Journal    
DOI: 10.1007/s11431-009-0230-1     Document Type: Article

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