Double pulse ultrafast laser ablation of nickel in vacuum

Journal of Applied Physics

Volumn 106, Issue 1, 2009, Pages

  Donnelly, T ^a   Lunney, J G ^a   Amoruso, S ^b   Bruzzese, R ^b   Wang, X ^b   Ni, X ^c  

^a TRINITY COLLEGE DUBLIN   (Ireland)

^b UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^c TIANJIN UNIVERSITY OF TECHNOLOGY AND EDUCATION   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATED MATERIALS; ABLATED VOLUME; ABLATION PLASMA PLUME; DOUBLE PULSE; IN-VACUUM; ION EMISSIONS; ION PROBE; ION YIELDS; SCANNING WHITE LIGHT INTERFEROMETRY; SINGLE PULSE; ULTRAFAST LASER ABLATION;

ANGULAR DISTRIBUTION; IONS; LASER ABLATION; LASER PULSES; LASERS; NICKEL ALLOYS; PULSED LASER DEPOSITION; THERMAL PLUMES; ULTRAFAST PHENOMENA;

PULSED LASER APPLICATIONS;

EID: 67650757480     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3159010     Document Type: Article

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