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Volumn 105, Issue 3, 2009, Pages

Langmuir probe characterization of laser ablation plasmas

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; ELECTRON TEMPERATURE; ION BOMBARDMENT; ION IMPLANTATION; IONS; LANGMUIR PROBES; LASER ABLATION; LASER APPLICATIONS; LASERS; MAGNETRONS; PLASMA APPLICATIONS; PLASMA DEVICES; PLASMA FLOW; PLASMA JETS; PLASMA SHEATHS; PLASMAS; PULSED LASER DEPOSITION; TELLURIUM COMPOUNDS;

EID: 60449090524     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3056131     Document Type: Article
Times cited : (87)

References (12)
  • 2
    • 0038078480 scopus 로고    scopus 로고
    • 0163-1829 10.1103/PhysRevB.67.104101.
    • B. Toftmann, J. Schou, and J. G. Lunney, Phys. Rev. B 0163-1829 10.1103/PhysRevB.67.104101 67, 104101 (2003).
    • (2003) Phys. Rev. B , vol.67 , pp. 104101
    • Toftmann, B.1    Schou, J.2    Lunney, J.G.3
  • 7
    • 0345954494 scopus 로고    scopus 로고
    • 1070-664X 10.1063/1.874162.
    • T. E. Sheridan, Phys. Plasmas 1070-664X 10.1063/1.874162 7, 3084 (2000).
    • (2000) Phys. Plasmas , vol.7 , pp. 3084
    • Sheridan, T.E.1
  • 11
    • 0001174669 scopus 로고    scopus 로고
    • 0021-8979 10.1063/1.370871.
    • K. U. Riemann and T. Daube, J. Appl. Phys. 0021-8979 10.1063/1.370871 86, 1202 (1999).
    • (1999) J. Appl. Phys. , vol.86 , pp. 1202
    • Riemann, K.U.1    Daube, T.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.