Observation of near total polarization in the ultrafast laser ablation of Si

Applied Physics Letters

Volumn 93, Issue 16, 2008, Pages

  Liu, Yaoming ^a   Singha, Sima ^a   Witt, Tana E ^a   Cheng, Yongtao ^a   Gordon, Robert J ^a  

^a UNIVERSITY OF ILLINOIS AT CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; EMISSION SPECTROSCOPY; FLUORESCENCE; LASER ABLATION; LASER BEAMS; LASER PULSES; LASERS; LIGHT EMISSION; LUMINESCENCE; POLARIZATION; PULSE GENERATORS; PULSED LASER DEPOSITION; SILICON; ULTRASHORT PULSES;

DISCRETE LINES; FEMTOSECOND ABLATIONS; FLUORESCENCE WAVELENGTHS; FOCUSING CONDITIONS; POLARIZATION SPECTRUM; POLARIZATION STATES; POLARIZED EMISSIONS; PULSE DELAYS; PULSE ENERGIES; SI(111); ULTRA-VIOLET; ULTRAFAST LASER ABLATIONS; ULTRASHORT LASER PULSES;

PULSED LASER APPLICATIONS;

EID: 54949122126     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3000966     Document Type: Article

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