Small-angle X-ray scattering from nano-Si embedded a-SiC:H deposited by hot-wire chemical vapor deposition

Solid State Sciences

Volumn 11, Issue 8, 2009, Pages 1408-1411

  Swain, Bibhu P ^a   Swain, Bhabani S ^a   Chung, Yung Bin ^a   Hwang, Nong M ^a  

^a Seoul National University   (South Korea)

Author keywords

HWCVD; Nc Si embedded a SiC:H; Raman; SAXS

Indexed keywords

A-SIC:H; CORRELATION LENGTHS; GAS PRECURSORS; HOT WIRE CHEMICAL VAPOR DEPOSITION; HWCVD; INTER-DIFFUSION; MASS FRACTALS; NANOCRYSTALLINE; NC-SI EMBEDDED A-SIC:H; RAMAN; SAXS; SMALL ANGLE X-RAY SCATTERING; SURFACE FRACTALS; XRD;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; CRYSTALLITE SIZE; FLOW RATE; FRACTALS; NANOCRYSTALLINE SILICON; RAMAN SPECTROSCOPY; SCATTERING; SILICON CARBIDE; VAPORS; WIRE; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

AMORPHOUS SILICON;

EID: 67650711092     PISSN: 12932558     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solidstatesciences.2009.04.015     Document Type: Article

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