Phase-separated polydimethylsiloxane as a dielectric surface treatment layer for organic field effect transistors

Organic Electronics

Volumn 10, Issue 6, 2009, Pages 1041-1047

  Chung, Dae Sung ^a   Lee, Dong Hoon ^a   Park, Jong Won ^b   Jang, Jaeyoung ^a   Nam, Sooji ^a   Kim, Yun Hi ^b   Kwon, Soon Ki ^b   Park, Chan Eon ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Gyeongsang National University   (South Korea)

Author keywords

Dielectric layer; Mobility; OFET; Phase separation; SAM

Indexed keywords

CARRIER MOBILITY; CURING; DIELECTRIC MATERIALS; HYDROPHOBICITY; LOW-K DIELECTRIC; MICROCHANNELS; PHASE SEPARATION; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SILICON OXIDES; SILICONES; SUBSTRATES; SURFACE TREATMENT; TRANSISTORS; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC LAYER; DIELECTRIC SUBSTRATES; DIELECTRIC SURFACE; DIMETHYLSILOXANE; MORPHOLOGY ANALYSIS; OCTADECYLTRICHLOROSILANE; POLYMERIC SEMICONDUCTORS; SPIN COATING PROCESS;

ORGANIC FIELD EFFECT TRANSISTORS;

EID: 67650707993     PISSN: 15661199     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.orgel.2009.05.012     Document Type: Article

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