Preparation of carbon-free TEM microgrids by metal sputtering

Ultramicroscopy

Volumn 109, Issue 9, 2009, Pages 1105-1109

  Janbroers, S ^a,b   de Kruijff, T R ^b   Xu, Q ^b   Kooyman, P J ^b,c   Zandbergen, H W ^b  

^a Albemarle Corporation   (United States)

^b DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Microgrids; Preparation; Sputtering; TEM

Indexed keywords

ELECTRICAL CONDUCTIVITY; ELECTRON TRANSPARENCY; METAL FILM; METAL SPUTTERING; MICRO GRID; MICROGRIDS; PLASMA CLEANING; PREPARATION; TEM; TEMPERATURE STABLE; TRANSMISSION ELECTRON MICROSCOPE; VACUUM CONDITION;

CARBON FILMS; ELECTRIC CONDUCTIVITY; ELECTRIC INVERTERS; GOLD; METAL FOIL; METALS; PALLADIUM; TRANSMISSION ELECTRON MICROSCOPY;

FILM PREPARATION;

CARBON; GOLD; PALLADIUM;

ARTICLE; ELECTRIC CONDUCTIVITY; MATERIAL COATING; THERMOSTABILITY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 67650532074     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2009.04.001     Document Type: Article

References (5)

1. Lazar S., Botton G.A., Wu M.Y., and Tichelaar F.D. Ultramicroscopy 96 (2003) 535
2. R.F. Egerton, Electron Energy-Loss Spectroscopy in the Electron microscope, second ed., Plenum Press, New York, p. 26, ISBN: 0-306-45223-5.
3. Zandbergen H.W., Pruymboom A., and van Tendeloo G. Ultramicroscopy 24 (1988) 45
4. Stokroos I., Kalicharan D., van der Want J.J.L., and Jongebloed W.L. Journal of Microscopy 189 (1998) 79
5. Kemmenoe B.H., and Bullock G.R. Journal of Microscopy 132 (1983) 153