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Volumn 69, Issue 2, 2009, Pages 187-194

The importance of non-local shadowing for the topography evolution of a-C:H films grown by toluene based plasma enhanced chemical vapor deposition

(3) Hormann, C a Meier, S a Moseler, M a,b

a FRAUNHOFER INSTITUTE FOR MECHANICS OF MATERIALS IWM (Germany)

b UNIVERSITY OF FREIBURG (Germany)

Author keywords

81.15.Aa Theory and models of film growth; 81.15.Gh Chemical vapor deposition

Indexed keywords

81.15.AA THEORY AND MODELS OF FILM GROWTH; 81.15.GH CHEMICAL VAPOR DEPOSITION; A-C:H FILMS; GROWTH EXPONENT; GROWTH MODELS; HYDROGENATED DIAMOND; NONLOCAL; NUMERICAL APPROACHES; SHADOWING EFFECTS; STOCHASTIC DIFFERENTIAL EQUATIONS; THIN-FILM DEPOSITION TECHNIQUE;

DEPOSITION; DIFFERENTIAL EQUATIONS; FILM GROWTH; INDUCTIVELY COUPLED PLASMA; MOLECULAR BEAM EPITAXY; PLASMA DEPOSITION; TOLUENE; VAPOR DEPOSITION; VAPORS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 67650287962 PISSN: 14346028 EISSN: 14346036 Source Type: Journal
DOI: 10.1140/epjb/e2009-00131-6 Document Type: Article

Times cited : (6)

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