Self-catalytic etching of silicon: From nanowires to regular mesopores

Physica Status Solidi (A) Applications and Materials Science

Volumn 206, Issue 6, 2009, Pages 1250-1254

  Boarino, L ^a   Destro, M ^a   Borini, S ^a   Pugno, N ^b   Chiodoni, A ^b   Bellotti, F ^a   Amato, G ^a  

^a ISTITUTO NAZIONALE DI RICERCA METROLOGICA   (Italy)

^b POLITECNICO DI TORINO   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROLLED MORPHOLOGY; CRYSTALLOGRAPHIC DIRECTIONS; MESO-PORES; METAL PATTERNING; NEW CLASS; PATTERNING TECHNIQUES; POROUS ALUMINA; POROUS SEMICONDUCTORS; POROUS SILICON LAYERS; PRE-PATTERNING; SELF-CATALYTIC; SILICON NANOWIRES; SUBSTRATE DOPING; TOP SURFACE;

ELECTRIC WIRE; MORPHOLOGY; NANOSPHERES; NANOWIRES; POLYSTYRENES; POROUS SILICON; SEMICONDUCTOR DOPING;

ELECTROCHEMICAL ETCHING;

EID: 67649975257     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200881068     Document Type: Article

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