Al3+-doped vanadium dioxide thin films deposited by PLD

Solar Energy Materials and Solar Cells

Volumn 93, Issue 9, 2009, Pages 1550-1554

  Chen, Bo ^a,b   Yang, Dongfang ^b   Charpentier, Paul A ^a   Zeman, Marco ^b  

^a UNIVERSITY OF WESTERN ONTARIO   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Intelligent coatings; Thermochromic; Vanadium dioxide

Indexed keywords

DOPING LEVELS; ELECTRICAL CONDUCTIVITY; ENERGY EFFICIENT; GLASS SUBSTRATES; INTELLIGENT COATINGS; METALLIC STATE; MONOCLINIC PHASE; PROCESSING CONDITION; RESISTANCE CHANGE; SMART WINDOWS; THERMOCHROMIC; TRANSITION TEMPERATURE; VANADIUM DIOXIDE; VANADIUM DIOXIDE THIN FILMS;

DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ENERGY EFFICIENCY; LASER ABLATION; LASER APPLICATIONS; LASERS; PHASE TRANSITIONS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; SEMICONDUCTOR LASERS; THIN FILMS; VANADIUM; VANADIUM ALLOYS;

ALUMINUM;

EID: 67649401710     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.04.005     Document Type: Article

References (19)

1. Morin F.J. Oxides which show a metal-to-insulator transition at the Neel temperature. Phys. Rev. Lett. 3 (1959) 34-36
2. 2. J. Solid State Chem. 3 (1971) 490-500
3. 2 thin films. Adv. Mater 9 3 (1997) 244-246
4. 2. J. Solid State Chem. 22 (1977) 423-438
5. 2. Mater. Res. Bull. 6 (1971) 119-130
6. Kitahiro I., and Watanabe A. Shift of transition temperature of vanadium dioxide crystals. Jpn. J. Appl. Phys. 6 (1967) 1023-1024
7. 2. Jpn. J. Appl. Phys. 6 (1967) 1060-1071
8. 2 thin films. Thin Solid Films 353 (1999) 40-44
9. 2. J. Phys. D: Appl. Phys. 41 (2008) 015402
10. Chrisey D.G., and Hubler G.K. Pulsed Laser Deposition of Thin Films (1994), Wiley Publications, New York
11. 5 thin films for electrochromic devices. J. Mater. Process. Technol. 197 (2008) 261-267
12. 2(001)-anatase supports. Surf. Interface Anal. 38 (2006) 1257-1265
13. 3 nanocomposite films prepared by dual target magnetron sputtering. Thin Solid Films 516 (2008) 8513-8516
14. Yang C.-S., Kim J.-S., Choi J.-W., Kwon M.-H., Kim Y.-J., Choi J.-G., and Kim G.-T. XPS study of aluminum oxides deposited on PET thin film. J. Ind. Eng. Chem. 6 3 (2000) 149-156
15. Ebinger H.D., and Yates Jr. J.T. Electron-impact-induced oxidation of Al(111) in water vapor: relation to the Cabrera-Mott mechanism. Phys. Rev. B 57 3 (1998) 1976-1984
16. Briggs D., and Seah M.P. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (1993), Wiley, New York
17. Zimmerman R., Claessen R., Reinert F., Steiner P., and Hüfner S. Strong hybridization in vanadium oxides: evidence from photoemission and absorption spectroscopy. J. Phys.: Condens. Matter 10 (1998) 5697-5716
18. Chen H.-K., Hung H.-C., Yang T.C.-K., and Wang S.-F. Strong hybridization in vanadium oxides: evidence from photoemission and absorption spectroscopy. J. Non-Cryst. Solids 347 (2004) 138-143
19. Klimov V.A., Timofeeva I.O., Khanin S.D., Shadrin E.B., Ilinskii A.V., and Silva-Andrade F. Tech. Phys. 47 9 (2002) 1134