Assessing airborne PM-bound arsenic exposure risk in semiconductor manufacturing facilities

Journal of Hazardous Materials

Volumn 167, Issue 1-3, 2009, Pages 976-986

  Chou, Wei Chun ^a   Chio, Chia Pin ^a   Liao, Chung Min ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

Airborne arsenic; Oxidative stress; Particular matter; PBPK model; Respiratory tract; Risk assessment; Semiconductor

Indexed keywords

AIRBORNE ARSENIC; PARTICULAR MATTER; PBPK MODEL; RESPIRATORY TRACT; SEMICONDUCTOR;

ARSENIC; BIOLOGICAL ORGANS; DNA; GENES; MATHEMATICAL OPERATORS; NUCLEIC ACIDS; OCCUPATIONAL RISKS; OXIDATIVE STRESS; PHYSIOLOGICAL MODELS; PNEUMATIC CONTROL EQUIPMENT; RISK ANALYSIS; RISK MANAGEMENT; RISK PERCEPTION; SAFETY FACTOR;

RISK ASSESSMENT;

ARSENIC;

ARSENIC; MANUFACTURING; NUMERICAL MODEL; OCCUPATIONAL EXPOSURE; PARTICULATE MATTER; RISK ASSESSMENT; SEMICONDUCTOR INDUSTRY;

AIR POLLUTION; ARTICLE; CONCENTRATION PROCESS; DNA DAMAGE; EPITHELIUM CELL; LIPID PEROXIDATION; LUNG ALVEOLUS EPITHELIUM; MONTE CARLO METHOD; OCCUPATIONAL EXPOSURE; PARTICULATE MATTER; QUANTITATIVE ANALYSIS; RISK ASSESSMENT; SEMICONDUCTOR; SKIN CELL;

AIR POLLUTANTS; ARSENIC; INDUSTRIAL WASTE; OCCUPATIONAL EXPOSURE; PARTICULATE MATTER; SEMICONDUCTORS;

EID: 67649295031     PISSN: 03043894     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jhazmat.2009.01.079     Document Type: Article

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