Effects of arsenic exposure among semiconductor workers: A cautionary note on urinary 8-oxo-7,8-dihydro-2′-deoxyguanosine

Free Radical Biology and Medicine

Volumn 40, Issue 7, 2006, Pages 1273-1278

  Hu, Chiung Wen ^a   Pan, Chih Hong ^b   Huang, Yeou Lih ^c   Wu, Ming Tsang ^c   Chang, Louis W ^d   Wang, Chien Jen ^d   Chao, Mu Rong ^a  

^a CHUNG SHAN MEDICAL UNIVERSITY   (Taiwan)

^b INSTITUTE OF OCCUPATIONAL SAFETY AND HEALTH   (Taiwan)

^c KAOHSIUNG MEDICAL UNIVERSITY   (Taiwan)

^d NATIONAL HEALTH RESEARCH INSTITUTES   (Taiwan)

Author keywords

Arsenic; Dimethylarsinic acid; Free radical; LC MS MS; Monomethylarsonic acid; Oxidatively damaged DNA; Semiconductor

Indexed keywords

8 HYDROXYDEOXYGUANOSINE; ARSENIC; BIOLOGICAL MARKER; CACODYLIC ACID; METHANEARSONIC ACID;

ADULT; ARTICLE; ATOMIC ABSORPTION SPECTROMETRY; CLINICAL ARTICLE; CONTROLLED STUDY; DEMOGRAPHY; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HUMAN; HUMAN EXPERIMENT; ISOTOPE DILUTION ASSAY; KIDNEY CONCENTRATING CAPACITY; MASS SPECTROMETRY; METHYLATION; OCCUPATIONAL EXPOSURE; OXIDATIVE STRESS; PRIORITY JOURNAL; SEMICONDUCTOR; SENSITIVITY AND SPECIFICITY; URINE LEVEL;

ADULT; ARSENIC; ARSENIC POISONING; ARSENICALS; CACODYLIC ACID; CHROMATOGRAPHY, LIQUID; DEOXYGUANOSINE; HUMANS; MASS SPECTROMETRY; OCCUPATIONAL EXPOSURE; OXIDATIVE STRESS; SEMICONDUCTORS;

ANIMALIA;

EID: 33644885720     PISSN: 08915849     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.freeradbiomed.2005.12.003     Document Type: Article

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