SCOPUS 정보 검색 플랫폼

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 3, 2009, Pages 1696-1700

Nanopatterning on silicon wafers using AFM-based lithography-for solar cells

(5) Lu, Hui Hsin a Lin, Chii Wann a,b,c Hsiao, Tzu Chien d Lee, Chih Kung c Hsu, Su Ming e

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b NATIONAL TAIWAN UNIVERSITY (Taiwan)

c NATIONAL TAIWAN UNIVERSITY (Taiwan)

d NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

e NATIONAL TAIWAN UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; AFM IMAGE; APPLIED BIAS; DWELL TIME; ELECTRICAL BIAS; IMAGING FEATURES; INTERACTION TIME; LINEAR PATTERNS; NANO PATTERN; NANOPATTERNING; OXIDE PATTERNS; WORKING ENVIRONMENT;

SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS;

ATOMIC FORCE MICROSCOPY;

EID: 67649200861 PISSN: 15334880 EISSN: None Source Type: Journal
DOI: 10.1166/jnn.2009.SI08 Document Type: Conference Paper

Times cited : (4)

References (14)

1
- 33847684760
- C. H. See and A. T. Harris, Ind. Eng. Chem. Res. 46, 997 (2007).
- (2007) Ind. Eng. Chem. Res. , vol.46 , pp. 997
- See, C.H.¹ Harris, A.T.²

2
- 29144515793
- H. Ditlbacher, A. Hohenau, D. Wagner, U. Kreibig, M. Rogers, F. Hofer, F. R. Aussenegg, and J. R. Krenn, Phys. Rev. Lett. 95, 257403 (2005).
- (2005) Phys. Rev. Lett. , vol.95 , pp. 257403
- Ditlbacher, H.¹ Hohenau, A.² Wagner, D.³ Kreibig, U.⁴ Rogers, M.⁵ Hofer, F.⁶ Aussenegg, F.R.⁷ Krenn, J.R.⁸

3
- 33746648133
- M. V. Yezhelyev, X. Gao, Y. Xing, A. Al-HajjS. Nie, and R. M. O'Regan, The Lancet Oncology 7, 657 (2006).
- (2006) The Lancet Oncology , vol.7 , pp. 657
- Yezhelyev, M.V.¹ Gao, X.² Xing, Y.³ Al-Hajj A.Nie, S.⁴ O'Regan, R.M.⁵

4
- 0036709790
- J. Jortner and C. N. R. Rao, Pure Appl. Chem. 74, 1491 (2002).
- (2002) Pure Appl. Chem. , vol.74 , pp. 1491
- Jortner, J.¹ Rao, C.N.R.²

5
- 67649176601
- W. Lu and C. M. Lieber, J. Phys. D: Appl. Phys. 39, R286 (2006).
- (2006) J. Phys. D: Appl. Phys. , vol.39
- Lu, W.¹ Lieber, C.M.²

6
- 0036693343
- Y. J. Chuang, F. G. Tseng, and W. K. Lin, Microsystem Technologies 8, 308 (2002).
- (2002) Microsystem Technologies , vol.8 , pp. 308
- Chuang, Y.J.¹ Tseng, F.G.² Lin, W.K.³

7
- 19744383454
- T. Kouh, D. Karabacak, D. H. Kim, and K. L. Ekinci, Appl. Phys. Lett. 86, 013106 (2005).
- (2005) Appl. Phys. Lett. , vol.86 , pp. 013106
- Kouh, T.¹ Karabacak, D.² Kim, D.H.³ Ekinci, K.L.⁴

8
- 0033614026
- R. D. Piner, J. Zhu, F. Xu, S. Hong, and C. A. Mirkin, Science 283, 661 (1999).
- (1999) Science , vol.283 , pp. 661
- Piner, R.D.¹ Zhu, J.² Xu, F.³ Hong, S.⁴ Mirkin, C.A.⁵

9
- 0034625767
- S. Hong and C. A. Mirkin, Science 288, 1808 (2000).
- (1808) Science , vol.288
- Hong, S.¹ Mirkin, C.A.²

10
- 62549131647
- D. S. Ginger, H. Zhang, and C. A. Mirkin, Angewandte Chemie International Edition 43, 30 (2004).
- (2004) Angewandte Chemie International , vol.43 , pp. 30
- Ginger, D.S.¹ Zhang, H.² Mirkin, C.A.³

11
- 14844344789
- J. Haaheim, R. Eby, M. Nelson, J. Fragala, B. Rosner, H. Zhang, and G. Athas, Vltramicroscopy 103, 117 (2005).
- (2005) Vltramicroscopy , vol.103 , pp. 117
- Haaheim, J.¹ Eby, R.² Nelson, M.³ Fragala, J.⁴ Rosner, B.⁵ Zhang, H.⁶ Athas, G.⁷

12
- 33645411896
- R. Garcia, R. V. Martinez, and J. Martinez, Chem. Soc. Rev. 35, 29 (2006).
- (2006) Chem. Soc. Rev. , vol.35 , pp. 29
- Garcia, R.¹ Martinez, R.V.² Martinez, J.³

13
- 85030684345
- Springer, Boston
- H. T. Soh, K. W. Guarini, and C. F. Quate, Scanning Probe Lithography, Springer, Boston (2001), Vol. 7, p. 23.
- (2001) Scanning Probe Lithography , vol.7 , pp. 23
- Soh, H.T.¹ Guarini, K.W.² Quate, C.F.³

14
- 0037461691
- S. Rozhok, R. Piner, and C. A. Mirkin, J. Phys. Chem. B 107, 751 (2003).
- (2003) J. Phys. Chem. B , vol.107 , pp. 751
- Rozhok, S.¹ Piner, R.² Mirkin, C.A.³

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.