Nanostructured sp2-Carbon infiltration of mesoporous silicon layers

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 6, 2009, Pages 3927-3931

  Polini, Riccardo ^a   Valentini, Veronica ^b   Mattei, Giorgio ^b  

^a UNIVERSITY OF ROME TOR VERGATA   (Italy)

^b CNR   (Italy)

Author keywords

Chemical vapor infiltration; Electron microscopy; Nanostructured carbon; Porous silicon; Raman spectroscopy

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; COLUMNAR STRUCTURES; COMPOSITE LAYER; DIAMOND NUCLEATION; FEG-SEM; FIELD EMISSION GUNS; HOT FILAMENT; MESOPOROUS; MESOPOROUS SILICON; MICRO RAMAN SPECTROSCOPY; NANO-STRUCTURED; NANOSTRUCTURED CARBON; NANOSTRUCTURED CARBONS; PROCESS CONDITION;

BENDING STRENGTH; CHEMICAL VAPOR DEPOSITION; CHEMICAL VAPOR INFILTRATION; COMPOSITE FILMS; DIAMOND FILMS; DIAMONDS; ELECTRON MICROSCOPES; EMISSION SPECTROSCOPY; FIELD EMISSION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEEPAGE; SOIL MECHANICS; SPECTRUM ANALYSIS; VAPORS;

POROUS SILICON;

EID: 67649195305     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.NS91     Document Type: Conference Paper

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