Advances in SLM development for microlithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7208, Issue , 2009, Pages

  Dauderstädt, Ulrike ^a   Askebjer, Per ^b   Björnängen, Peter ^b   Dürr, Peter ^a   Friedrichs, Martin ^a   Lisf, Matthias ^a   Rudloff, Dirk ^a   Schmidt, Jan Uwe ^a   Muller, Michael ^a   Wagner, Michael ^a  

^a FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS   (Germany)

^b Micronic Laser Systems AB   (Sweden)

Author keywords

DUV; Microlithography; Optical MEMS; Spatial Light Modulator

Indexed keywords

A-FRAMES; ALUMINIUM ALLOYS; CD UNIFORMITY; CHARGING EFFECT; DUV; FRAUNHOFER; HIGH REFLECTIVITY; IMAGE GENERATIONS; INORGANIC MATERIALS; LASER SYSTEMS; MACHINE PERFORMANCE; MASK WRITER; MECHANICAL SUSPENSION; MICRO MIRROR; MICROLITHOGRAPHY; MICROMIRROR ARRAY; NEW TECHNOLOGIES; OPTICAL MEMS; OPTICAL QUALITIES; PLANARIZATION; SACRIFICIAL LAYER; SACRIFICIAL MATERIAL; SPATIAL LIGHT MODULATOR; SPATIAL LIGHT MODULATORS; THIN LAYERS;

CADMIUM ALLOYS; CHEMICAL MECHANICAL POLISHING; CHEMICAL POLISHING; ELECTRODES; LIGHT MODULATION; MASKS; MEMS; MICROELECTROMECHANICAL DEVICES; MIRRORS; SYSTEM STABILITY;

LIGHT MODULATORS;

EID: 67649195223     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.810787     Document Type: Conference Paper

References (5)

1. A high-end mask writer using a spatial light modulator, Ulric B. Ljungblad, Per Askebjer, Tord Karlin, Tor Sandstrom, and Henrik Sjoeberg, Proc. SPIE 5721, 43 (2005).
2. Ulrike Dauderstädt, Peter Dürr, Ulric Ljungblad, Tord Karlin, Harald Schenk, Hubert Lakner, Mechanical Stability of Spatial Light Modulators in Microlithography, Proc. SPIE Vol. 5721, p. 64-71, MOEMS Display and Imaging Systems III, edited by Hakan Ürey, David L. Dickensheets, Jan 2005.
3. 3 - Journal of Microlithography, Microfabrication, and Microsystems Vol. 7(2), 1 (Apr - Jun 2008).
4. Mathias Krellmann, Martin Friedrichs, Ulrike Dauderstädt, Michael Wagner, Hubert Lakner, Bending of Aluminum Alloy Beams depending on Lrradiance and Repetition Rate of UV Laser Radiation, Proc. of SPIE Vol. 6111 611109-2, p. 76-83, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS V; Danelle M. Tanner, Rajeshuni Ramesham; Eds.
5. Schmidt, J.-U., Friedrichs, M., Bakke, T., Voelker, B., Rudloff, D., Lakner, H., Technology development for micromirror arrays with high optical fill factor and stable analogue deflection integrated on CMOS substrates, Ürey, H., Society of Photo-Optical Instrumentation Engineers-SPIE-, Bellingham/Wash., MEMS, MOEMS, and Micromachining III. Proceedings: Strasbourg, France, 9 April 2008, Bellingham, WA: SPIE, 2008, Paper 69930D, (SPIE Proceedings Series 6993).