Mechanical stability of spatial light modulators in microlithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5721, Issue , 2005, Pages 64-71

  Dauderstädt, Ulrike ^a   Dürr, Peter ^a   Ljungblad, Ulric ^b   Karlin, Tord ^b   Schenk, Harald ^a   Lakner, Hubert ^a  

^a FRAUNHOFER INSTITUTE FOR MICROELECTRONIC CIRCUITS AND SYSTEMS   (Germany)

^b Micronic Laser Systems AB   (Sweden)

Author keywords

DUV; Mechanical Drift; Optical MEMS; Spatial Light Modulator

Indexed keywords

ELECTRIC POTENTIAL; LASERS; LITHOGRAPHY; MICROELECTROMECHANICAL DEVICES; MIRRORS; OXYGEN; PLASMAS; STABILITY;

DUV; MECHANICAL DRIFT; MECHANICAL STABILITY; OPTICAL MEMS;

LIGHT MODULATION;

EID: 21844452692     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.590082     Document Type: Conference Paper

References (9)

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