SCOPUS 정보 검색 플랫폼

Nanotechnology

Volumn 20, Issue 25, 2009, Pages

Alignment for imprint lithography using nDSE and shallow molds

(4) Picciotto, Carl a Gao, Jun a Yu, Zhaoning a Wu, Wei a

a HEWLETT PACKARD LABORATORIES (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALIGNMENT ERROR; ALIGNMENT MARKS; IMPRINT LITHOGRAPHY; NANO SCALE; NANOSCALE DISPLACEMENT SENSING; OVERLAY ALIGNMENT; PROCESS VARIATION; REAL ESTATE; SILICON AREA;

MOLDS; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURED MATERIALS; OPTICAL MICROSCOPY; OPTICAL SYSTEMS; POSITION MEASUREMENT; SILICON WAFERS;

ALIGNMENT;

SILICON;

ACCURACY; ARTICLE; INTERMETHOD COMPARISON; MEASUREMENT ERROR; MICROSCOPY; NANOFABRICATION; NANOIMPRINT LITHOGRAPHY; NANOSENSOR; NANOTECHNOLOGY; PARTICLE SIZE; PRIORITY JOURNAL;

EID: 67649185931 PISSN: 09574484 EISSN: 13616528 Source Type: Journal
DOI: 10.1088/0957-4484/20/25/255304 Document Type: Article

Times cited : (6)

References (9)

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- Wu, W.¹ Al, E.²

2
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- Image displacement sensing (nDSE) for achieving overlay alignment
- Picciotto C, Gao J, Hoarau E and Wu W 2005 Image displacement sensing (nDSE) for achieving overlay alignment Appl. Phys. A 80 1287
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- Picciotto, C.¹ Gao, J.² Hoarau, E.³ Wu, W.⁴

3
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- Gao, J.¹ Picciotto, C.² Jackson, W.³

4
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- Metrology of image placement
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- Starikov, A.¹

5
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- Critical issues in overlay metrology
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- Sullivan, N.T.¹

6
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- Overlay metrology: The systematic, the random and the ugly
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7
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- Multi-layer overlay metrology
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- Ausschnitt, C.P.¹ Morningstar, J.² Muth, W.³ Schneider, J.⁴ Yerdon, R.J.⁵ Binns, L.A.⁶ Smith, N.P.⁷

8
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- NDSE based overlay alignment: Enabling technology for nano metrology and fabrication
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9
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- Yu Z, Wu W, Gao J and Picciotto C 2006 US patent pending: nanoimprint molds and methods of forming the same US Patent Specification 20080067721A1 file 9/14/2006
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- Yu, Z.¹ Wu, W.² Gao, J.³ Picciotto, C.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.