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Volumn 15, Issue 8, 2009, Pages 1273-1277

A low-cost through via interconnection for ISM WLP

Author keywords

[No Author keywords available]

Indexed keywords

CMOS IMAGE SENSOR; DEVICE WAFERS; ELECTRICAL CONNECTION; ELECTRICAL INTERCONNECTIONS; FABRICATION PROCESS; HIGH QUALITY; LARGE OPENINGS; LOW COSTS; PAD OXIDES; PASSIVATION LAYER; PHOTO IMAGES; PROCESS COSTS; RE-ROUTING; SENSOR DEVICE; SENSOR PACKAGING; SMALL SIZE; THROUGH-SILICON-VIA; UNIT PROCESS; VIA FILLING; VIA HOLE; VIA INTERCONNECTION; WAFER LEVEL PACKAGE; WAFER LEVEL PACKAGING;

EID: 67649184767     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-008-0766-1     Document Type: Conference Paper
Times cited : (8)

References (3)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.