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Volumn 15, Issue 8, 2009, Pages 1273-1277
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A low-cost through via interconnection for ISM WLP
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS IMAGE SENSOR;
DEVICE WAFERS;
ELECTRICAL CONNECTION;
ELECTRICAL INTERCONNECTIONS;
FABRICATION PROCESS;
HIGH QUALITY;
LARGE OPENINGS;
LOW COSTS;
PAD OXIDES;
PASSIVATION LAYER;
PHOTO IMAGES;
PROCESS COSTS;
RE-ROUTING;
SENSOR DEVICE;
SENSOR PACKAGING;
SMALL SIZE;
THROUGH-SILICON-VIA;
UNIT PROCESS;
VIA FILLING;
VIA HOLE;
VIA INTERCONNECTION;
WAFER LEVEL PACKAGE;
WAFER LEVEL PACKAGING;
COSTS;
DIGITAL IMAGE STORAGE;
ELECTRIC CONNECTORS;
GLASS BONDING;
IMAGE SENSORS;
INTERCONNECTION NETWORKS;
PASSIVATION;
SILICON WAFERS;
WAFER BONDING;
ELECTRONICS PACKAGING;
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EID: 67649184767
PISSN: 09467076
EISSN: None
Source Type: Journal
DOI: 10.1007/s00542-008-0766-1 Document Type: Conference Paper |
Times cited : (8)
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References (3)
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