SCOPUS 정보 검색 플랫폼

Volumn 159-160, Issue C, 2009, Pages 99-102

Effect of processing on microstructure of Si:Mn

c DESY (Germany)

Author keywords

Annealing; High pressure; Implantation; Interstitial oxygen; Mn; Si; Spintronics

Indexed keywords

HIGH PRESSURE EFFECTS; HYDROSTATIC PRESSURE; MANGANESE; MANGANESE COMPOUNDS; MICROSTRUCTURE; SILICON; SILICON COMPOUNDS; X RAY DIFFRACTION;

ANNEALING; ENERGY; FLOATING ZONES; HIGH PRESSURE; IMPLANTATION; INTERSTITIAL OXYGEN; ION DOSE; MN; MN IONS; SI;

OXYGEN;

EID: 67349273031 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/j.mseb.2008.06.034 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.