Synthesis and characterization of electrochemically deposited nanocrystalline CdTe thin films

Materials Chemistry and Physics

Volumn 116, Issue 1, 2009, Pages 261-268

  Singh, Ragini Raj ^a,c   Painuly, Diksha ^b   Pandey, R K ^a  

^a BARKATULLAH UNIVERSITY   (India)

^b UNIVERSITY OF KERALA   (India)

^c TEL AVIV UNIVERSITY   (Israel)

Author keywords

Atomic force microscopy; Cadmium telluride; Cyclic voltammetery; Grazing angle X ray diffraction; Optical spectroscopy; Thin films

Indexed keywords

ABSORPTION EDGES; ACIDIC BATHS; ATOMIC-FORCE MICROSCOPIES; BLUE SHIFTS; CADMIUM TELLURIDE; CALCULATED VALUES; CDTE; CUBIC PHASE; CYCLIC VOLTAMMETERY; DEPOSITION TEMPERATURES; EFFECTIVE MASS APPROXIMATIONS; ENERGY-DISPERSIVE ANALYSIS; GRAZING ANGLE X-RAY DIFFRACTION; INDIUM-TIN OXIDE COATED GLASS; NANO-CRYSTALLINE; OPTICAL SPECTROSCOPY; OPTICAL STUDIES; SATURATED CALOMEL REFERENCE ELECTRODES; SEMICONDUCTOR THIN FILMS; SIZE DEPENDENTS; SYNTHESIS AND CHARACTERIZATIONS; THEORETICAL PREDICTIONS; TIGHT-BINDING APPROXIMATIONS; UV-VIS SPECTROSCOPIES; X-RAY DIFFRACTIONS;

ABSORPTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CADMIUM; CADMIUM ALLOYS; CADMIUM COMPOUNDS; DIFFRACTION; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; NANOCRYSTALLINE MATERIALS; OPTICAL MICROSCOPY; OPTICAL PROPERTIES; OXIDE FILMS; SEMICONDUCTING CADMIUM TELLURIDE; THIN FILMS; TIN; TITANIUM COMPOUNDS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

OPTICAL FILMS;

EID: 67349270555     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2009.03.024     Document Type: Article

References (51)

1. Patel N.G., and Patel P.G. Solid State Electrochem. 35 (1992) 1269
2. Goldsmid H.J., Giutronich J.E., and Kalia M.M. Sol. Energy 24 (1980) 435
3. Mathew X., and Sebastian P.J. Sol. Energy Mater. Sol. Cells 59 (1999) 85
4. Chandramohan R., Mahalingam T., Chu J.P., and Sebastian P.J. Sol. Energy Mater. Sol. Cells 81 (2004) 371
5. Deshmukh S.K., Kokate A.V., and Sathe D.J. Mater. Sci. Eng. B 122 (2005) 206
6. Hu J., Odom T.W., and Lieber C.M. Acc. Chem. Res. 32 (1999) 435
7. Xia Y., Yang P., Sun Y., Wu Y., Mayers B., Gates B., Yin Y., Kim F., and Yan H. Adv. Mater. 15 (2003) 353
8. Duan X., Huang Y., Agarwal R., and Lieber C.M. Nature 421 (2003) 241
9. Gratzel M. Nature 414 (2001) 338
10. Huynh W.U., Dittmer J.J., and Alivisatos A.P. Science 295 (2002) 2425
11. Mattousi H., Mauro J.M., Goldman E.R., Anderson G.P., Sunder V.C., Mikulec F.V., and Bawendi M.G. J. Am. Chem. Soc. 122 (2000) 12142
12. Sarmah K.C., and Das H.L. Thin Solid Films 198 (1991) 29
13. Gould R.D., Gravano S., and Ismail B.B. Thin Solid Films 198 (1991) 93
14. Rohtagi A., Ringel S.A., Meyers P.V., Liu C.H., and Rananathan V. Solar Cells 27 (1989) 219
15. Huang B.M., Colletti L.P., Gregory B.W., Anderson J.L., and Stickney J.L. J. Electrochem. Soc. 142 9 (1995) 3007
16. Bicknell R.N., Giles N.C., and Schetzina J.F. Appl. Phys. Lett. 49 (1986) 1095
17. Panicker M.P.R., Knaster M., and Kroger S.A. J. Electrochem. Soc. 125 (1978) 566
18. Ham D., Mishra K.K., Wiess A., and Rajeshwar K. Chem. Mater. 1 (1989) 17
19. Miyake M., Inui H., Murase K., Hirato T., and Awakura Y. J. Electrochem. Soc. 151/3 (2004) C168
20. Kröger F.A. J. Electrochem. Soc. 125 (1978) 2028
21. Danaher W.J., and Lyons L.E. Aust. J. Chem. 37 (1984) 689
22. Takahashi M., Uosaki K., and Kita H. J. Electrochem. Soc. 131 (1984) 2304
23. Sella C., Boncorps P., and Vedel J. J. Electrochem. Soc. 133 (1986) 2043
24. Mori E., and Rajeshwar K. J. Electrochem. Soc. 258 (1989) 415
25. Ham D., Mishra K.K., and Rajeshwar K. J. Electrochem. Soc. 138 (1991) 100
26. Murase K., Uchida H., Hirato T., and Awakura Y. J. Electrochem. Soc. 146 (1999) 531
27. Saraby-Reintjes A., Peter L.M., Özsan M.E., and Webster S. J. Electrochem. Soc. 140 (1993) 2880
28. Lincot D., Kampmann A., Mokili B., Vedel J., Cortes R., and Froment M. Appl. Phys. Lett. 67 (1995) 2355
29. Pourbaix M. Atlas d'Equilibres Electrochimiques a 22 °C (1963), Gauthier-Villars & Cie, Paris
30. Kampmann A., Cowache P., Vedel J., and Lincot D. J. Electrochem. Soc. 387 (1995) 53
31. Duffy N.W., Peter L.M., Wang R.L., Lane D.W., and Rogers K.D. Electrochim. Acta 45 (2000) 3355
32. Ernst K., Belaidi A., and Konenkamp R. Semicond. Sci. Technol. 18 (2003) 475
33. Singh R.S., Rangari V.K., Sanagapalli S., Jayaraman V., Mahendra S., and Singh V.P. Sol. Energy Mater. Sol. Cells 82 (2004) 315
34. Choi J.W., and Lee H.C. Semicond. Sci. Technol. 17/3 (2002) 266
35. Bayer N.E., Davis G.D., Buchner S.P., and Ahearn J.S. In: Verweij J.F., and Wloters D.R. (Eds). Insulating Films on Semiconductors (1983), Elsevier, New York 238
36. Mainzer N., Weiss E., Laser D., and Shaanau M. J. Vac. Sci. Technol. A 7 (1989) 460
37. Meulenkamp E.A., and Peter L.M. J. Chem. Soc., Faraday Trans. 92 (1996) 4077
38. Lepiller C., and Lincot D. J. Electrochem. Soc. 151 (2004) C348
39. Morris G.C., and Vanderveen R.J. Sol. Energy Mater. Sol. Cells 30 (1993) 339
40. Pandey R.K., Sahu S.N., and Chandra S. Handbook of Semiconductor Electrodeposition (1996), Marcel Dekker, Inc., New York
41. Mathew X. J. Phys. D 33 (2000) 1565
42. Lifshin E. X-ray Characterization of Materials (1954), Wiley-VCH, New York p. 491
43. Mastai Y., and Hodes G. J. Phys. Chem. B 101 (1997) 2685
44. Pankov J.I. Optical Processes in Semiconductors (1975), Dover, New York
45. Efros Al.L., and Efros A.L. Sov. Phys. Semicond. 16 (1982) 772
46. Wang Y., Suna A., Mahler W., and Kasowski R. J. Chem. Phys. 87 (1987) 7315
47. Wang L.W., and Zunger A. Phys. Rev. B 51 (1995) 17398
48. Lippens P.E., and Lannoo M. Phys. Rev. B 39 (1989) 10935
49. Brus L.E. J. Chem. Phys. 80 (1984) 4403
50. Hill N.A., and Whaley K.B. J. Chem. Phys. 100 (1994) 2831
51. Sapra S., and Sarma D.D. Phys. Rev. B 69 (2004) 125304