Fabrication and surface functionalization of high aspect ratio plastic nanostructures

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1724-1728

  Shi, J ^a,b   Peroz, C ^a   Velve Casquillas, G ^a   Pepin A ^a   Belotti, M ^a   Xu, L P ^c   Peyrade, D ^d   Chen, Y ^a,b  

^a CNRS   (France)

^b ECOLE NORMALE SUPÉRIEURE   (France)

^c PEKING UNIVERSITY   (China)

^d Joseph Fourier University   (France)

Author keywords

Nanofabrication; Nanoimprint; Plastic devices

Indexed keywords

ASPECT RATIO; NANOIMPRINT LITHOGRAPHY; PLASTIC PRODUCTS; REACTIVE ION ETCHING; ULTRAVIOLET RADIATION;

PLASTIC DEVICES; PLASTIC NANOSTRUCTURES; SOFT UV NANOIMPRINT LITHOGRAPHY;

NANOSTRUCTURES;

LITHOGRAPHY; PLASTICS; PRINTING; ULTRAVIOLET RADIATION;

EID: 34247881937     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.191     Document Type: Article

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