Silicon nitride passivated bifacial Cz-silicon solar cells

Solar Energy Materials and Solar Cells

Volumn 93, Issue 8, 2009, Pages 1435-1439

  Janssen L ^a,c   Windgassen, H ^a   Batzner D L ^a   Bitnar, B ^b   Neuhaus, H ^b  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b Deutsche Cell GmbH   (Germany)

^c Solland Solar Cells GmbH   (Germany)

Author keywords

Bifacial; PECVD; Silicon nitride; Surface passivation

Indexed keywords

BACK SURFACE FIELDS; BASE MATERIAL; BIFACIAL; HIGHER EFFICIENCY; INDUSTRIAL PRODUCTION; LOW RESISTIVITY; NEW PROCESS; PECVD; REAR SURFACES; SCREEN-PRINTED; SURFACE PASSIVATION;

CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); PHOTOVOLTAIC CELLS; SILICON NITRIDE; SILICON SOLAR CELLS; SOLAR CELLS; SURFACES;

PASSIVATION;

EID: 67349220717     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2009.03.015     Document Type: Article

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