Poly vinyl alcohol re-usable masters for microneedle replication

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 752-756

  Matteucci, Marco ^a   Fanetti, M ^b   Casella, M ^c,d   Gramatica, F ^c   Gavioli, L ^b,e   Tormen, M ^e   Grenci, G ^e   De Angelis, F ^d   Di Fabrizio, E ^d,e  

^a SINCROTRONE TRIESTE   (Italy)

^b UNIVERSITÀ CATTOLICA DEL SACRO CUORE   (Italy)

^c IRCCS FONDAZIONE DON CARLO GNOCCHI   (Italy)

^d UNIVERSITY MAGNA GRAECIA OF CATANZARO   (Italy)

^e LABORATORIO TASC   (Italy)

Author keywords

DXRL; Microneedles; PMMA; PVA; Soft lithography

Indexed keywords

DXRL; MICRONEEDLES; PMMA; PVA; SOFT LITHOGRAPHY;

LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; SILICONES; SURFACE ROUGHNESS; X RAY LITHOGRAPHY;

PHOTORESISTS;

EID: 67349210360     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.068     Document Type: Article

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