Photodegradation of lauric acid at an anatase single crystal surface studied by atomic force microscopy

Applied Catalysis B: Environmental

Volumn 88, Issue 3-4, 2009, Pages 407-412

  Zaleska, A ^a   Nalaskowski, J ^b   Hupka, J ^a   Miller, J D ^b  

^a GDANSK UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF UTAH   (United States)

Author keywords

AFM; Anatase; Photooxidation; Rutile; Single crystal

Indexed keywords

AFM; ANATASE; ATOMIC FORCES; ATOMIC-FORCE MICROSCOPIES; CONTACT LINES; DOMAIN STRUCTURES; LAURIC ACIDS; PROCESSING CONDITIONS; RUTILE; SPIN COATING TECHNIQUES; SUBMONOLAYER FILMS;

ACIDS; ATOMIC FORCE MICROSCOPY; OXIDE MINERALS; PHOTODEGRADATION; PHOTOOXIDATION; SINGLE CRYSTAL SURFACES; TITANIUM DIOXIDE;

TITANIUM OXIDES;

EID: 67349194933     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2008.10.020     Document Type: Article

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