Sputter deposition and XPS analysis of nickel silicide thin films

Surface and Coatings Technology

Volumn 203, Issue 19, 2009, Pages 2886-2890

  Tam, P L ^a   Nyborg, L ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Ion beam sputter (IBS) deposition; Nickel silicides; X ray photoelectron spectroscopy (XPS)

Indexed keywords

AISI 304L STAINLESS STEELS; BINARY COMPONENTS; CHEMICAL STATE; COVALENT BONDINGS; EFFECTIVE HEAT OF FORMATIONS; NI-SI SYSTEMS; NICKEL SILICIDE THIN FILMS; NICKEL SILICIDES; PHASE FORMATIONS; SI CONTENTS; SI FILMS; VALENCE BAND SPECTRUM; X-RAY PHOTOELECTRON SPECTROSCOPY (XPS); XPS; XPS ANALYSIS;

CHEMICAL ELEMENTS; ELECTRON SPECTROSCOPY; ELECTRONIC STRUCTURE; ION BEAMS; IONS; NICKEL; NICKEL ALLOYS; NICKEL COMPOUNDS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SEMICONDUCTING SILICON COMPOUNDS; SILICIDES; SILICON; SPECTRUM ANALYSIS; SPUTTER DEPOSITION; THERMOCHEMISTRY; THIN FILMS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 67349185057     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.03.001     Document Type: Article

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