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Thin Solid Films

Volumn 347, Issue 1-2, 1999, Pages 278-283

Silicidation reactions with Co-Ni bilayers for low thermal budget microelectronic applications

(3) Saha, S K a Howell, R S a Hatalis, M K a

a Lehigh University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; COBALT; COBALT COMPOUNDS; INTERFACES (MATERIALS); MICROELECTRONICS; MULTILAYERS; NICKEL; NICKEL COMPOUNDS; SILICON; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BILAYER FILMS; SHEET RESISTANCE; SILICIDATION REACTIONS;

ULTRATHIN FILMS;

EID: 0345633677 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(99)00013-9 Document Type: Article

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.