Polishing of (1 0 0) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD

Journal of Alloys and Compounds

Volumn 479, Issue 1-2, 2009, Pages

  Lin, Hui ^a,b   Zhou, Shengming ^a   Teng, Hao ^a,b   Jia, Tingting ^a,b   Hou, Xiaorui ^a,b   Gu, Shulin ^c   Zhu, Shunming ^c   Xie, Zili ^c   Han, Ping ^c   Zhang, Rong ^c  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

Semiconductors; Thin films; Vapor deposition; X ray diffraction

Indexed keywords

EID: 67349131576     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2008.12.086     Document Type: Letter

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