Structural and optical properties of amorphous oxygenated iron boron nitride thin films produced by reactive co-sputtering

Thin Solid Films

Volumn 517, Issue 15, 2009, Pages 4281-4285

  Essafti, A ^a   Abouelaoualim, A ^a   Fierro, J L G ^b   Ech chamikh, E ^a  

^a FACULTÉ DES SCIENCES SEMLALIA   (Morocco)

^b INSTITUTO DE CATÁLISIS Y PETROLEOQUÍMICA   (Spain)

Author keywords

Amorphous thin films; Boron nitride; Co sputtering; Optical properties; Spectroscopy characterization; X ray reflectometry

Indexed keywords

AMORPHOUS FILMS; BOND STRENGTH (CHEMICAL); BORON NITRIDE; CHEMICAL ANALYSIS; CRYSTAL ATOMIC STRUCTURE; ENERGY GAP; III-V SEMICONDUCTORS; INFRARED DEVICES; IRON COMPOUNDS; NITRIDES; OPTICAL PROPERTIES; OXYGEN; REACTIVE SPUTTERING; REFLECTION; REFLECTOMETERS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS THIN FILMS; BORON NITRIDE THIN FILMS; COSPUTTERING; HEXAGONAL BORON NITRIDE; RADIO-FREQUENCY SPUTTERING; STRUCTURAL AND OPTICAL PROPERTIES; TRANSMITTANCE AND REFLECTANCES; X-RAY REFLECTOMETRY;

OPTICAL FILMS;

EID: 67349127033     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.127     Document Type: Article

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