Novel separation process for free-standing silicon thin-films

Solar Energy Materials and Solar Cells

Volumn 93, Issue 6-7, 2009, Pages 710-712

  Tobail, O ^a   Reuter, M ^a   Eisele, S ^a   Werner, J H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Layer transfer; Porous Si; Selective etching

Indexed keywords

CELL THICKNESS; DEVICE FABRICATIONS; DEVICE LAYERS; FLEXIBLE CELLS; FOREIGN SUBSTRATES; LAYER SEPARATIONS; LAYER TRANSFER; MECHANICALLY STABLES; MONOCRYSTALLINE; NOVEL METHODS; NOVEL SEPARATION PROCESS; POROUS SI; SELECTIVE ETCHING; SI LAYERS; THIN-FILMS;

ETCHING; PHOTOVOLTAIC CELLS; SEPARATION; SILICON; SILICON WAFERS; SOLAR CELLS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 67349106695     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2008.09.014     Document Type: Article

References (6)

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