Anodizing method yielding multiple porous seed layers for the epitaxial growth of monocrystalline Si films

Journal of the Electrochemical Society

Volumn 153, Issue 3, 2006, Pages

  Rostan, P J ^a   Berge, C ^a   Rau, U ^a   Werner, J H ^a  

^a UNIVERSITY OF STUTTGART   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANODIC OXIDATION; CRYSTALLINE MATERIALS; EPITAXIAL GROWTH; ETCHING; POROUS MATERIALS; THIN FILMS;

MULTIPLE POROUS SEED LAYERS; POROUS FILMS; SEEDING LAYERS; SILICON FILMS;

POROUS SILICON;

EID: 32044449585     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2158569     Document Type: Article

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