Optimization of BSE-detectors for E-beam direct write lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Alves, H ^a   Hahmann, P ^a   Slodowski, M ^a   Frase, C G ^b   Gnieser, D ^b   Johnsen, K P ^b   Bosse, H ^b  

^a Vistee Electron Beam GmbH   (Germany)

^b PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

BSE detector; E beam; Monte Carlo simulations; Topographic marks

Indexed keywords

BACKSCATTERED ELECTRONS; BSE DETECTOR; DETECTOR DESIGN; DIRECT-WRITE LITHOGRAPHY; E-BEAM; GEOMETRY OPTIMIZATION; MONTE CARLO SIMULATION; MONTE CARLO SIMULATIONS; THEORETICAL CALCULATIONS; THEORETICAL RESULT; TOPOGRAPHIC MARKS;

ACOUSTIC INTENSITY; ANGULAR DISTRIBUTION; DETECTORS; MONTE CARLO METHODS; OPTICAL RESOLVING POWER; SIGNAL TO NOISE RATIO;

BLIND SOURCE SEPARATION;

EID: 67149145251     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814156     Document Type: Conference Paper

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