Improved contrast and reflectivity of multilayer reflective optics for wavelengths beyond the Extreme UV

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7271, Issue , 2009, Pages

  Tsarfati, Tim ^a   Zoethout, Erwin ^a   Louis, Eric ^a   Van Kruijs, Robbert De ^a   Yakshin, Andrey ^a   Müllender, Stephan ^b   Bijkerk, Fred ^a,c  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

B4C La; Lithography; Multilayer; Nitridation; Reflectometry; XPS

Indexed keywords

13.5 NM; AT-WAVELENGTH; B4C/LA; EXPERIMENTAL STUDIES; EXTREME UV; INTERFACE PASSIVATION; INTERLAYER FORMATION; NORMAL INCIDENCE; OPTICAL CONTRAST; PLASMA TREATMENT; REFLECTIVE OPTICS; REFLECTOMETRY; XPS;

PASSIVATION; PLASMA APPLICATIONS; REFLECTION; REFLECTOMETERS; X RAY PHOTOELECTRON SPECTROSCOPY;

MULTILAYERS;

EID: 67149099814     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824434     Document Type: Conference Paper

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