Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6921, Issue , 2008, Pages

  Van Den Boogaard, A J R ^a   Louis, E ^a   Zoethout, E ^a   Van Der Westen, S Alonso ^a   Bijkerk, F ^a   Mullender S ^b  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b CARL ZEISS SMT AG   (Germany)

Author keywords

EUV lithography; Mo si multilayers; Roughness; Smoothening

Indexed keywords

MO/SI MULTILAYERS; MULTI-LAYER-COATING; ROUGH SUBSTRATES; SMOOTHENING; SMOOTHING LAYERS; SPATIAL FREQUENCY;

COATINGS; EXTREME ULTRAVIOLET LITHOGRAPHY;

MULTILAYERS;

EID: 67149084743     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772479     Document Type: Conference Paper

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