Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

Optics Express

Volumn 17, Issue 12, 2009, Pages 9515-9525

  Cheng, G ^a,b   Mishchik, K ^a,b   Mauclair, C ^a,b   Audouard, E ^a,b   Stoian, R ^a,b  

^a UNIVERSITÉ JEAN MONNET   (France)

^b UNIVERSITÉ DE LYON   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; FUSED SILICA; LASER BEAM EFFECTS; LASER PULSES; LIGHT; LIGHT SCATTERING; OPTICAL PROPERTIES; POLARIZATION; SILICA; ULTRAFAST LASERS; ULTRASHORT PULSES;

ANISOTROPIC OPTICAL PROPERTIES; ANISOTROPIC SCATTERING; MODULATED STRUCTURES; POLARIZATION-SENSITIVE DEVICES; REFLECTION CHARACTERISTICS; THREE-DIMENSIONAL PATTERNS; ULTRASHORT-PULSED LASER; WAVEGUIDING STRUCTURES;

PULSED LASERS;

GLASS; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; COMPUTER AIDED DESIGN; EQUIPMENT; EQUIPMENT DESIGN; INSTRUMENTATION; LASER; METHODOLOGY; PHOTOCHEMISTRY; RADIATION EXPOSURE; REFRACTOMETRY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY;

COMPUTER-AIDED DESIGN; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; GLASS; LASERS; PHOTOCHEMISTRY; REFRACTOMETRY; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY; SILICON DIOXIDE;

EID: 66849132419     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.17.009515     Document Type: Article

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