Autophobic dewetting of a poly(methyl methacrylate) thin film on a silicon wafer treated in good solvent vapor

Langmuir

Volumn 25, Issue 9, 2009, Pages 5135-5140

  Xue, Longjian ^a   Han, Yanchun ^a  

^a CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ACETONE VAPORS; AUTOPHOBIC DEWETTING; DE-WETTING; ENTROPY EFFECTS; EXPONENTIAL FUNCTIONS; FILM SURFACES; MEAN SIZE; NATIVE OXIDE LAYER; NON-SOLVENT; RIM INSTABILITIES; SOLVENT PROPERTIES; SOLVENT VAPORS;

ACETONE; ESTERS; ETHERS; OXIDE FILMS; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SOLVENTS; SURFACE TENSION;

VAPORS;

EID: 66549090551     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la8041814     Document Type: Article

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